International Patent: CLEANING METHOD, ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ETCHING SYSTEM

GENEVA, Aug. 7 -- CENTRAL GLASS COMPANY, LIMITED filed a patent application (JP2026/002898) for “CLEANING METHOD, ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ETCHING SYSTEM”. With publication no. WO/2026/164165, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10P 70/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....