GENEVA, May 18 -- CHOLESGEN (SHANGHAI) CO. LTD. (3/Floor, Building 1, No. 400, Fangchun Road, China (Shanghai) Pilot Free Trade ZonePudong New Area, Shanghai 201203), 珂阑(上海)医药科技有限公司 (中国上海市浦东新区(上海)自由贸易实验区芳春路400号1栋3层) filed a patent application (PCT/CN2025/133861) for "RNAI CONSTRUCT FOR INHIBITING ASGR1 GENE EXPRESSION AND USE THEREOF" on Nov 10, 2025. With publication no. WO/2026/098680, the details related to the patent application was published on May 15, 2026.
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