GENEVA, Sept. 24 -- FUJIFILM CORPORATION filed a patent application (JP2026/003283) for “CHEMICAL SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE”. With publication no. WO/2026/196829, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 70/00
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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