INTERNATIONAL PATENT: CENTRAL GLASS COMPANY, LIMITED, セントラル硝子株式会社 FILES APPLICATION FOR "ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND ETCHING APPARATUS"

GENEVA, May 11 -- CENTRAL GLASS COMPANY, LIMITED (5253, Oaza Okiube, Ube-shi, Yamaguchi7550001), セントラル硝子株式会社 (山口県宇部市大字沖宇部５２５３番地) filed a patent application (PCT/JP2025/037418) for "ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ETCHING APPARATUS" on Oct 24, 2025. With publication no. WO/2026/094799, the details related to the patent application was published on May 07, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Proper...