INTERNATIONAL PATENT: CENTRAL GLASS COMPANY, LIMITED, セントラル硝子株式会社 FILES APPLICATION FOR "DRY ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ETCHING APPARATUS AND ETCHING GAS COMPOSITION"

GENEVA, March 18 -- CENTRAL GLASS COMPANY, LIMITED (5253, Oaza Okiube, Ube-shi, Yamaguchi7550001), セントラル硝子株式会社 (山口県宇部市大字沖宇部５２５３番地) filed a patent application (PCT/JP2025/031793) for "DRY ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ETCHING APPARATUS, AND ETCHING GAS COMPOSITION" on Sep 09, 2025. With publication no. WO/2026/054107, the details related to the patent application was published on Mar 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed b...