GENEVA, May 10 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2025/076276) for "OPTICAL SYSTEM, PROJECTION OPTICAL UNIT, AND PROJECTION EXPOSURE SYSTEM" on Sep 16, 2025. With publication no. WO/2026/092911, the details related to the patent application was published on May 07, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SITEK, Bernhard (Rudolf-Eber-Strasse 273447 Oberkochen)
Abstract: The invention relates to an optical system (100) for a projection exposure system (1), having an optical element (104, 106, 108); a mount (132) which suppo...