GENEVA, March 30 -- CANON KABUSHIKI KAISHA (30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo1468501), キヤノン株式会社 (東京都大田区下丸子３丁目３０番２号) filed a patent application (PCT/JP2025/032122) for "METHOD FOR FORMING CONTACT HOLE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Sep 11, 2025. With publication no. WO/2026/063332, the details related to the patent application was published on Mar 26, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inve...