INTERNATIONAL PATENT: BUHLER ALZENAU GMBH FILES APPLICATION FOR "SPATIAL ATOMIC LAYER DEPOSITION DEVICE AND A METHOD FOR COATING A SUBSTRATE"

GENEVA, April 13 -- BUHLER ALZENAU GMBH (SiemensstraBe 8863755 Alzenau) filed a patent application (PCT/EP2025/078104) for "SPATIAL ATOMIC LAYER DEPOSITION DEVICE AND A METHOD FOR COATING A SUBSTRATE" on Sep 30, 2025. With publication no. WO/2026/073963, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): THAKUR, Abhishekkumar (Lindenstr. 263538 Grosskrotzenburg), HOLOPAINEN, Jani (Wallweg 1963450 Hanau), MINGELS, Stephan (Mary-Cassatt-Weg 463225 Langen), KARTHIKEYAN, Gurumani (Dietrich-Bonhoeffer-Strasse 1563150 Heusentstamm...