GENEVA, July 6 -- RESEARCH FOUNDATION OF THE CITY UNIVERSITY OF NEW YORK filed a patent application (US2025/031158) for “BOTTOM-UP FABRICATION VIA POLYMER BRUSH HYPERSURFACE PHOTOLITHOGRAPHY”. With publication no. WO/2026/142737, here are the other details related to the patent application:
Kind: Initial Publication without ISR [A2]
IPC: none
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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