GENEVA, July 2 -- APPLIED MATERIALS, INC. filed a patent application (US2025/059655) for “BORON PASSIVATION FOR GATE OXIDE IN TRANSISTORS”. With publication no. WO/2026/136240, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10D 30/67
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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