International Patent: BEVEL EDGE DEPOSITION BY INTRODUCTION OF PRECURSOR, REACTANT AND CONFINEMENT GASES VIA AN UPPER RING ASSEMBLY

GENEVA, Oct. 1 -- LAM RESEARCH CORPORATION filed a patent application (CN2026/078921) for “BEVEL EDGE DEPOSITION BY INTRODUCTION OF PRECURSOR, REACTANT AND CONFINEMENT GASES VIA AN UPPER RING ASSEMBLY”. With publication no. WO/2026/189123, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/455

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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