INTERNATIONAL PATENT: BEIJING IC-EAST SEMICONDUCTOR TECHNOLOGY CO., LTD, 北京芯东来半导体科技有限公司 FILES APPLICATION FOR "TOPOLOGY OPTIMIZATION METHOD FOR MAIN SUBSTRATE OF PHOTOLITHOGRAPHY MACHINE"

Posted On: 2026-04-05

GENEVA, April 5 -- BEIJING IC-EAST SEMICONDUCTOR TECHNOLOGY CO., LTD (Room 210-1, 2nd Floor, Building 56No. 21 Beihongluo East RoadDazhong Fule VillageHuairou District, Beijing 101400), 北京芯东来半导体科技有限公司 (中国北京市怀柔区大中富乐村北红螺东路21号56幢2层210-1室) filed a patent application (PCT/CN2025/124002) for "TOPOLOGY OPTIMIZATION METHOD FOR MAIN SUBSTRATE OF PHOTOLITHOGRAPHY MACHINE" on Sep 25, 2025. With publication no. WO/2026/067540, the details related to the patent application was published on Apr 02, 2026.

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INTERNATIONAL PATENT: BEIJING IC-EAST SEMICONDUCTOR TECHNOLOGY CO., LTD, 北京芯东来半导体科技有限公司 FILES APPLICATION FOR "TOPOLOGY OPTIMIZATION METHOD FOR MAIN SUBSTRATE OF PHOTOLITHOGRAPHY MACHINE"