INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR OPTIMIZING PLASMA GENERATION IN AN EUV LIGHT SOURCE"

GENEVA, May 10 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/078883) for "SYSTEMS AND METHODS FOR OPTIMIZING PLASMA GENERATION IN AN EUV LIGHT SOURCE" on Oct 07, 2025. With publication no. WO/2026/092972, the details related to the patent application was published on May 07, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CALKINS, William, Lucas (17075 Thornmint CourtSan Diego, California 92127), NIKOLAEV, Ivan (17075 Thornmint CourtSan Diego, California 92127), PICH, Cherish (17075 Thornmint CourtSan Diego, California 92127), MAYEDA, Jason, ...