INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR GENERATING EUV RADIATION FROM LASER-PRODUCED PLASMAS"

GENEVA, April 18 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/078465) for "SYSTEMS AND METHODS FOR GENERATING EUV RADIATION FROM LASER-PRODUCED PLASMAS" on Oct 02, 2025. With publication no. WO/2026/077838, the details related to the patent application was published on Apr 16, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Haining (17075 Thornmint CourtSan Diego, California 92127), HAHN, Eric, Nicholas (17075 Thornmint CourtSan Diego, California 92127), RAMME, Mark (17075 Thornmint CourtSan Diego, California 92127), PURVIS, Michael, A...