INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "SYSTEMS AND METHODS FOR DEBRIS MITIGATION IN EUV LIGHT SOURCES"

GENEVA, April 5 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/075387) for "SYSTEMS AND METHODS FOR DEBRIS MITIGATION IN EUV LIGHT SOURCES" on Sep 05, 2025. With publication no. WO/2026/068166, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SELLAPPAN, Prabu (17075 Thornmint CourtSan Diego, California 92127), BELEKAR, Viraj Vilas (17075 Thornmint CourtSan Diego, California 92127), FRENZEL, Alex, James (17075 Thornmint CourtSan Diego, California 92127)

Abstract: Systems and...