INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "OPTICAL METROLOGY METHOD AND SYSTEM"

GENEVA, May 18 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/079524) for "OPTICAL METROLOGY METHOD AND SYSTEM" on Oct 14, 2025. With publication no. WO/2026/098901, the details related to the patent application was published on May 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAN DIJK, John, Godefriedus, Louisa (P.O. Box 3245500 AH Veldhoven), BERBEN, Maarten (P.O. Box 3245500 AH Veldhoven), PAGANO, Roberto (P.O. Box 3245500 AH Veldhoven)

Abstract: A method of determining a positional instability of an image sensor. The method compris...