GENEVA, May 10 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/078636) for "METHODS OF LITHOGRAPHY ON A RECONSTITUTED SUBSTRATE" on Oct 06, 2025. With publication no. WO/2026/092960, the details related to the patent application was published on May 07, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SELEN, Jori (P.O. Box 3245500 AH Veldhoven), WERKMAN, Roy (P.O. Box 3245500 AH Veldhoven), HAUPTMANN, Marc (P.O. Box 3245500 AH Veldhoven)
Abstract: Disclosed is a method of determining a correction for performing a lithographic exposure on a reco...