INTERNATIONAL PATENT: ASML NETHERLANDS B.V. FILES APPLICATION FOR "IMPROVED DOSE CONTROL IN A LITHOGRAPHIC APPARATUS"

GENEVA, March 2 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/070192) for "IMPROVED DOSE CONTROL IN A LITHOGRAPHIC APPARATUS" on Jul 15, 2025. With publication no. WO/2026/041306, the details related to the patent application was published on Feb 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HARTGERS, Albertus (P.O. Box 3245500 AH Veldhoven), STEEGHS, Marco, Matheus, Louis (P.O. Box 3245500 AH Veldhoven), VAN SLUISVELD, Wouterus, Jozephus, Johannes (P.O. Box 3245500 AH Veldhoven), STOFFELS, Freerk, Adriaan (P.O. Box 3245500 AH Veldhoven...