GENEVA, April 27 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/076285) for "GAS FLOW APPARATUS AND METHOD FOR USE IN AN OPTICAL SYSTEM" on Sep 16, 2025. With publication no. WO/2026/082355, the details related to the patent application was published on Apr 23, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): BHARDWAJ, Shikhar (P.O. Box 3245500 AH Veldhoven), HUANG, Zhuangxiong (P.O. Box 3245500 AH Veldhoven)
Abstract: A gas flow apparatus for use in an optical system comprising an optical element defining an optical surface, wherein the gas f...