GENEVA, March 23 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/074295) for "DOSE MEASUREMENT SYSTEM FOR A LITHOGRAPHIC APPARATUS" on Aug 26, 2025. With publication no. WO/2026/057328, the details related to the patent application was published on Mar 19, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): DE MUNSHI, Debashis (P.O. Box 3245500 AH Veldhoven), GANG, Tian (P.O. Box 3245500 AH Veldhoven)
Abstract: The present disclosure relates to a dose measurement system for a lithographic apparatus. The dose measurement system comprises: a target ...