GENEVA, May 10 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/077182) for "DETERMINING A FRINGE HEIGHT REDUCTION FACTOR FOR AN INTERFERENCE PATTERN" on Sep 23, 2025. With publication no. WO/2026/092920, the details related to the patent application was published on May 07, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SYED, Rafeeq (77 Danbury RoadWilton, Connecticut 06897)
Abstract: One embodiment provides a method comprising obtaining a Fourier transform of an interference pattern, obtaining a central band component from the Fourier transf...