GENEVA, March 2 -- ASML NETHERLANDS B.V. (P.O. Box 3245500 AH Veldhoven) filed a patent application (PCT/EP2025/071710) for "CLEANING A PORTION OF A LITHOGRAPHIC APPARATUS" on Jul 28, 2025. With publication no. WO/2026/041356, the details related to the patent application was published on Feb 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ALVAREZ DIAZ, Manuel, Antonio (77 Danbury RoadWilton, Connecticut 06897), ZHANG, Jiazong (77 Danbury RoadWilton, Connecticut 06897), BAHETI, Ankur, Ramesh (77 Danbury RoadWilton, Connecticut 06897), ZIMMERMAN, John, David (77 Danbury RoadWilton, Connec...