INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "RETAINING RING FOR SUBSTRATE POLISHER"

GENEVA, March 24 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/045939) for "RETAINING RING FOR SUBSTRATE POLISHER" on Sep 10, 2024. With publication no. WO/2026/059543, the details related to the patent application was published on Mar 19, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): OH, Jeonghoon (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), FUJIKAWA, Takashi (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), NAGENGAST,...