INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "HYBRID INDUCTIVELY COUPLED PLASMA SOURCE FOR ION AND RADICAL ETCHING"

GENEVA, April 8 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/049218) for "HYBRID INDUCTIVELY COUPLED PLASMA SOURCE FOR ION AND RADICAL ETCHING" on Sep 30, 2024. With publication no. WO/2026/072056, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SARODE, Yogananda (Applied Materials India Pvt. Ltd, Inventor Bldg, 1International Tech Park, Whitefield RoadBangalore 560066), POULOSE, John (974 E. Arques Ave.M/S 81305Sunnyvale, California 94085), BABAYAN, S...