GENEVA, June 19 -- AIXTRON SE filed a patent application (EP2025/081630) for “APPARATUS AND METHOD FOR TREATING SUBSTRATES IN A CVD REACTOR”. With publication no. WO/2026/104215, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 72/30
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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