GENEVA, July 31 -- IUCF-HYU(INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) filed a patent application (KR2026/001287) for “APPARATUS AND METHOD FOR IMPROVING EUV MASK INSPECTION ACCURACY”. With publication no. WO/2026/160861, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 1/84
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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