INTERNATIONAL PATENT: ANJI MICROELECTRONICS TECHNOLOGY (SHANGHAI) CO., LTD, 安集微电子科技（上海）股份有限公司 FILES APPLICATION FOR "METHOD FOR PREPARING CERIUM HYDROXIDE DISPERSION AND CERIUM HYDROXIDE PARTICLE DISPERSION"

Posted On: 2026-04-05

GENEVA, April 5 -- ANJI MICROELECTRONICS TECHNOLOGY (SHANGHAI) CO., LTD (T6-9, No. 5001, Huadong Road, Jinqiao Export Processing Zone (South Zone)Pudong New Area, Shanghai 201201), 安集微电子科技（上海）股份有限公司 (中国上海市浦东新区华东路5001号金桥出口加工区（南区）T6-9栋底层) filed a patent application (PCT/CN2025/119657) for "METHOD FOR PREPARING CERIUM HYDROXIDE DISPERSION AND CERIUM HYDROXIDE PARTICLE DISPERSION" on Sep 08, 2025. With publication no. WO/2026/066993, the deta...

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इस लेख के रीप्रिंट को खरीदने या इस प्रकाशन का पूरा फ़ीड प्राप्त करने के लिए, कृपया हमे संपर्क करें.

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INTERNATIONAL PATENT: ANJI MICROELECTRONICS TECHNOLOGY (SHANGHAI) CO., LTD, 安集微电子科技（上海）股份有限公司 FILES APPLICATION FOR "METHOD FOR PREPARING CERIUM HYDROXIDE DISPERSION AND CERIUM HYDROXIDE PARTICLE DISPERSION"