International Patent: ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE PRODUCTION METHOD, AND COMPOUND

GENEVA, Oct. 9 -- FUJIFILM CORPORATION filed a patent application (JP2026/011907) for “ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE PRODUCTION METHOD, AND COMPOUND”. With publication no. WO/2026/211467, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/004

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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