International Patent: ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/006949) for “ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE”. With publication no. WO/2026/186559, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/004

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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