INTERNATIONAL PATENT: ACM RESEARCH (SHANGHAI),INC., 盛美半导体设备(上海)股份有限公司 FILES APPLICATION FOR "SPRAYING APPARATUS AND SUBSTRATE PROCESSING DEVICE"
GENEVA, May 9 -- ACM RESEARCH (SHANGHAI) , INC. (BUILDING 4, NO. 1690 CAI LUN ROAD, CHINA (SHANGHAI) PILOT FREE TRADE ZONEPudong New Area, Shanghai 201203), 盛美半导体设备(上海)股份有限公司 (中国上海市浦东新区中国(上海)自由贸易试验区蔡伦路1690号第4幢) filed a patent application (PCT/CN2025/123144) for "SPRAYING APPARATUS AND SUBSTRATE PROCESSING DEVICE" on Sep 23, 2025. With publication no. WO/2026/091976, the details related to the patent application was published on May...
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हमे संपर्क करें.