International Patent: A SUBSTRATE SUPPORT ASSEMBLY, EXPOSURE APPARTUS COMPRISING A SUBSTRATE SUPPORT ASSEMBLY, AND METHOD

GENEVA, Sept. 7 -- ASML NETHERLANDS B.V. filed a patent application (EP2026/051777) for “A SUBSTRATE SUPPORT ASSEMBLY, EXPOSURE APPARTUS COMPRISING A SUBSTRATE SUPPORT ASSEMBLY, AND METHOD”. With publication no. WO/2026/180143, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/20

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....