Japan Intellectual Property Rights: SUBSTRATE PROCESSING DEVICE, GAS NOZZLE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM

Japan, March 6 -- KOKUSAI ELECTRIC CORP has got intellectual property rights for 'SUBSTRATE PROCESSING DEVICE, GAS NOZZLE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM.' Other related details are as follows:

Application Number: JP,2022-152431

Category (FI): C23C16/455,H01L21/31@C,H10P50/28,H10P50/20,101@H,H10P14/694@B,H10P14/60,101@C,H01L21/318@B,C23C16/44@J,H01L21/302,101@H

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Sept. 26, 2022

Publication Date: April 5, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....