Japan, Sept. 18 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING APPARATUS.' Other related details are as follows:

Application Number: JP,2025-090190

Category (FI): H10P95/90,101@P,H01L21/324@P,H01L21/324@G,H10P95/90,101@G,H10P50/20,101@C,H10P95/90,101@R,H10P95/90,101@J,H05B6/10,381,H01L21/324@R,H01L21/302,101@C,H01L21/324@J,H05H1/46@L

Stage: PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of wirelessly adjusting the temperature of an inner wall surface of a processing space in which substrate processing is performed.SOLUTION: A substrate processing apparatus for processing a substrate includes a processing chamber in which a processing space for the substrate is formed, a hea...