Japan, Sept. 14 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING APPARATUS, PLASMA MEASUREMENT METHOD, AND PLASMA ADJUSTMENT METHOD.' Other related details are as follows:

Application Number: JP,2022-195125

Category (FI): C23C16/52,H05H1/00@A,H05H1/46@M,C23C16/505

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Dec. 6, 2022

Publication Date: June 18, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....