Japan, Sept. 14 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE PROCESSING APPARATUS, PLASMA MEASUREMENT METHOD, AND PLASMA ADJUSTMENT METHOD.' Other related details are as follows:
Application Number: JP,2022-195125
Category (FI): C23C16/52,H05H1/00@A,H05H1/46@M,C23C16/505
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Dec. 6, 2022
Publication Date: June 18, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....