Japan, April 22 -- SAMSUNG SDI CO LTD has got intellectual property rights for 'SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION.' Other related details are as follows:
Application Number: JP,2024-033606
Category (FI): G03F7/004,501,G03F7/004,531,G03F7/20,501
Stage: Grant (IP right granted following substantive examination.)
Filing Date: March 6, 2024
Publication Date: Oct. 25, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....