Japan, March 23 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST UNDERLAYER FILM MATERIAL, PATTERN FORMING METHOD, AND METHOD OF FORMING RESIST UNDERLAYER FILM.' Other related details are as follows:

Application Number: JP,2023-031420

Category (FI): G03F7/09,501,G03F7/11,502,G03F7/11,503,G03F7/26,511,G03F7/38,501

Stage: Grant (IP right document published.)

Filing Date: March 1, 2023

Publication Date: Sept. 12, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....