Japan, Oct. 5 -- MELTEX INC has got intellectual property rights for 'RESIST REMOVER AND METHOD FOR FORMING SUBSTRATE MATERIAL WITH CONDUCTOR PATTERN USING THE SAME.' Other related details are as follows:

Application Number: JP,2024-014667

Category (FI): G03F7/40,521,G03F7/42,H01L21/30,572@B,H05K3/18@D,H05K3/18@Z,H10P76/00,572@B

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Feb. 2, 2024

Publication Date: Aug. 15, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....