Japan Intellectual Property Rights: RESIST MATERIAL AND PATTERN FORMING PROCESS

Japan, Sept. 3 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST MATERIAL AND PATTERN FORMING PROCESS.' Other related details are as follows:

Application Number: JP,2023-085306

Category (FI): G03F7/004,503@A,C07D311/16,101,C07D311/44,G03F7/20,501,G03F7/20,521,G03F7/038,601,C07D311/12,C07D333/76,G03F7/039,601,G03F7/004,501,C07D335/06,C07D333/54

Stage: Grant (IP right granted following substantive examination.)

Filing Date: May 24, 2023

Publication Date: Dec. 18, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....