Japan Intellectual Property Rights: POSITIVE RESIST MATERIAL AND PATTERN FORMING METHOD

Japan, Sept. 14 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'POSITIVE RESIST MATERIAL AND PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-156693

Category (FI): G03F7/004,504,G03F7/004,501,G03F7/20,521,G03F7/20,501,C08F212/04,G03F7/039,601,G03F7/004,503@A,C07D333/76,C08F220/18,G03F7/004,531

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Sept. 22, 2023

Publication Date: April 30, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....