Japan, March 23 -- NIPPON POLYTECH CORP has got intellectual property rights for 'POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, ORGANIC EL ELEMENT PARTITION WALL, ORGANIC EL ELEMENT INSULATING FILM, AND ORGANIC EL ELEMENT.' Other related details are as follows:

Application Number: JP,2024-168394

Category (FI): C08F220/30,G03F7/004,505,G03F7/023,G03F7/075,501,G03F7/075,521,H10K59/122,H10K85/10

Stage: Grant (IP right document published.)

Filing Date: Sept. 27, 2024

Publication Date: April 16, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....