Japan Intellectual Property Rights: POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE

Japan, Sept. 3 -- DISCO CORP has got intellectual property rights for 'POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE.' Other related details are as follows:

Application Number: JP,2022-141942

Category (FI): H10P52/00@H,H10P52/00@W,H10P52/40,B24B37/00@H,C09K3/14,550@Z,C09K3/14,550@D,C09G1/02,H01L21/304,622@W,H01L21/304,622@D

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Sept. 7, 2022

Publication Date: March 19, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....