Japan, July 1 -- DISCO CORP has got intellectual property rights for 'POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE AND METHOD FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE.' Other related details are as follows:
Application Number: JP,2022-077190
Category (FI): B24B37/00@H,H01L21/304,622@C,H10P52/40,H10P52/00@W,H10P52/00@G,C09G1/02,C09K3/14,550@Z,H01L21/304,622@W
Stage: Grant (IP right granted following substantive examination.)
Filing Date: May 9, 2022
Publication Date: Nov. 21, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....