Japan, Aug. 14 -- KIOXIA CORP has got intellectual property rights for 'PLASMA PROCESSING DEVICE AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE.' Other related details are as follows:
Application Number: JP,2022-202346
Category (FI): H10P50/28,H01L21/302,101@G,H10P50/20,101@G,H10P14/60,101@C,H01L21/31@C
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Dec. 19, 2022
Publication Date: July 1, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....