Japan, Feb. 27 -- HITACHI HIGH-TECH CORP has got intellectual property rights for 'PLASMA PROCESSING APPARATUS.' Other related details are as follows:
Application Number: JP,2023-136280
Category (FI): H10P50/20,101@D,H10P50/20,103,H01L21/302,103,H01L21/302,101@D
Stage: PROBLEM TO BE SOLVED: To provide a plasma processing apparatus that is not affected by a decrease in intensity of light caused by misalignment of optical axes of an irradiating unit and a light receiving unit.SOLUTION: A plasma processing apparatus includes:a processing chamber in which plasma is formed; a sample stage that is disposed inside the processing chamber and allows a wafer 109 to be placed thereon; a light transmissive dielectric window that is disposed above th...