Japan, July 1 -- RESONAC HOLDINGS CORP has got intellectual property rights for 'PHOTOSENSITIVE RESIN FILM, RESIST PATTERN FORMING METHOD, AND WIRING PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-188413

Category (FI): G03F7/028,G03F7/004,502,G03F7/004,512,H05K3/18@D

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Nov. 2, 2023

Publication Date: Jan. 11, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....