Japan, March 25 -- ASAHI KASEI CORP has got intellectual property rights for 'PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PHOTOSENSITIVE ELEMENT.' Other related details are as follows:
Application Number: JP,2022-034831
Category (FI): G03F7/004,502,H05K3/18@D,G03F7/031,G03F7/004,512
Stage: Grant (IP right granted following substantive examination.)
Filing Date: March 7, 2022
Publication Date: Sept. 20, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....