Japan, July 6 -- KIOXIA CORP has got intellectual property rights for 'PATTERN FORMATION METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND TEMPLATE.' Other related details are as follows:
Application Number: JP,2022-099537
Category (FI): H01L21/30,502@D,H10P76/00,600
Stage: Grant (IP right granted following substantive examination.)
Filing Date: June 21, 2022
Publication Date: Jan. 9, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
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