Japan Intellectual Property Rights: ORGANOMETALLIC COMPOUND, PHOTOSENSITIVE MATERIAL FOR PHOTORESIST, AND PHOTORESIST

Japan, July 31 -- SAN APRO KK has got intellectual property rights for 'ORGANOMETALLIC COMPOUND, PHOTOSENSITIVE MATERIAL FOR PHOTORESIST, AND PHOTORESIST.' Other related details are as follows:

Application Number: JP,2022-179229

Category (FI): G03F7/004,503@Z,G03F7/004,531,G03F7/004,C07F7/00@Z,C07F7/00@A,C07C311/03,C07C309/06,C07C381/12

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Nov. 9, 2022

Publication Date: May 21, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....