Japan Intellectual Property Rights: NONIONIC OXIME COMPOUND, ORGANOMETALLIC COMPOUND, ACID GENERATOR, RESIST PHOTOSENSITIVE MATERIAL, AND RESIST

Japan, July 31 -- SAN APRO KK has got intellectual property rights for 'NONIONIC OXIME COMPOUND, ORGANOMETALLIC COMPOUND, ACID GENERATOR, RESIST PHOTOSENSITIVE MATERIAL, AND RESIST.' Other related details are as follows:

Application Number: JP,2022-179788

Category (FI): G03F7/004,531,C07C321/28,C07C309/73,C07C251/66,G03F7/004,503@A,C08F2/50,C07C309/65,G03F7/20,503,G03F7/20,521,G03F7/20,504,G03F7/004,C07F7/00@Z,C07C321/20

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Nov. 9, 2022

Publication Date: May 21, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....